- Introduction
- The following books are ones that we have in our library and have found to be particularly useful. Any of the Lattice Press titles may be oredered driectly from us. Click on a category to view our recommendations:
Chemical Mechanical Planarization
- J. M. Steigerwald, S.P. Murarka, and R.J. Gutmann, "Chemical Mechanical Planarization of Microelectronic Materials," Wiley (1997). The only book we have seen on CMP.
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Chemical Vapor Deposition
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Device Physics
- S.M. Sze, "Physics of Semiconductor Devices,2nd Edition," Wiley (1981). The classic reference on device theory.
- E.H. Nicollian and J.R. Brews, "MOS Physics and Technology" Wiley (1982). The classic reference on the MOS capacitor.
- B. G. Streetman and S Banerjie, "Solid State Electronic Devices 5th Edition," Prentice Hall (2000). The classic introductory text book of semiconductor device theory.
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Dry Etch
- B. Chapman, "Glow Discharge Processes: Sputtering and Plasma Etching," Wiley (1980). The best book we have seen covering the fundamentals of plasma processes. The book does not include recent developments in plasma chemistry and high density systems, but the fundamental principle required to understand plasma processes are presented in a very detailed and understandable way.
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General
- S. Wolf, "Microchip Manufacturing," Lattice Press (2003). This brand new book is the first full color book on IC technology. It is written at an easier to understand level than previous books by Dr. Wolf. This is an excellent text book for an introductory undergraduate course or for technicians.
- A. S. Grove, "Physics and Technology of Semiconductor Devices" Wiley (1967). A classic. Although this book is somewhat dated, the chapters on diffusion and oxidation are excellent examples of how a technical book should be written. The chapters on device physics remain useful today.
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General Fabrication Technology
- S. Wolf, "Microchip Manufacturing," Lattice Press (2003). This brand new book is the first full color book on IC technology. It is written at an easier to understand level than previous books by Dr. Wolf. This is an excellent text book for an introductory undergraduate course or for technicians.
- S. Wolf, "Silicon Processing for the VLSI Era: Vol 4 Deep-Submicron Process Technology," Lattice Press (2002). This recent release covers all of the latest critical technologies for IC fabrication and does it in a well written and comprehensive manner.
- S. Wolf and R.N. Tauber, "Silicon Processing for the VLSI Era: Vol. 1 Process Technology 2nd Ed," Lattice Press (2000). The entire book is written by the two authors offering better consistency of material than multi author books. This book is a follow-on to the popular 1st edition and has been extensively rewritten with a lot of new material. Well written throughout with very complete coverage.
- Yoshio Nishi and Robert Doering editors., "Handbook of Semiconductor Manufacturing Technology," Marcel Dekker (2000). An encyclopedic treatment of semiconductor manufacturing with 37 chapters written by experts in each field. The book covers wafer fabrication, assembly, final test, yield enhancement, factory design and operation, safety, reliability and economics. 1,157 pages in an 8" x 11" format the book is massive. We have only read selected chapters to-date, but what we have read looks quite good.
- C.Y. Chang and S.M. Sze, editors, "ULSI Technology," McGraw Hill (1996). A very well written follow up to VLSI Technology. A number of new chapters covering wafer cleaning and Fab design and operation have been added. Unfortunately, not all topics necessary to develop a full understanding of wafer processing are presented.
- S.M. Sze editor, "VLSI Technology, 2nd Edition," McGraw Hill (1988). Although ULSI Technology is now out, VLSI Technology contains coverage of Diffusion, Oxidation and Ion Implantation that is missing from the newer book. Each chapter is written by a different expert. The chapters are well written and uniformly good.
- W.E. Beadle, J.C.C. Tsai, and R.D. Plummer editors, "Quick Reference Manual for Silicon Integrated Circuit technology," Wiley (1985). A great reference book. Last time we checked it was out of print.
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Ion Implantation
- J.F. Ziegler editor, "Handbook of Ion Implantation Technology," North-Holland (1992). Each chapter is written by experts in a particular area of ion implantation, we particularly like the chapter on Ion Implantation Applications in CMOS Process Technology.
- Emanuele Rimini, "Ion Implantaion Basics to Device Fabrication" Kluwer Academic Publishers (1995). Another good book on ion implantation.
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Photolithography
- J.R. Sheats and B.W. Smith, editors, "Microlithography: Science and Technology," Marcel Dekker (1998). The best book available on Microlithography. Written by a group of experts, uniformly excellent.
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Physical Vapor Deposition
- John E. Mahan, "Physical Vapor Deposition of Thin Films" Wiley (1999). Very well written and complete coverage of PVD.
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Process Integration
- S. Wolf, "Silicon Processing for the VLSI Era, Volume 2: Process Integration," Lattice Press (1990). The only book we are aware of exclusively devoted to process integration. An essential reference, although somewhat dated. We hope to see an updated addition published someday as we use this book a lot.
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Rapid Thermal Processing
- V.E. Borisenki and P.J. Hesketh, "Rapid Thermal Processing of Semiconductors," Plenum Press (1997) Very comprehensive and well written book.
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